University of Delaware - College of Engineering
ELECTRICAL & COMPUTER ENGINEERING

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Nanofabrication Facility

Capabilities & Equipment

Lithography

Photolithography

Karl Suss MJB-3 Mask Aligner
  • Karl Suss MJB-3 Mask Aligner
    • The Karl Suss MJB-3 HP/350W Mask Aligner for high resolution (0.6 micron) photolithography provides exposures at 365 and 405 nm wavelength.
    ABM Mask Aligner
  • ABM Mask Aligner
    • The UV/deep UV mask aligner from ABM, Inc. provides filters for ultra high resolution lithography at 365nm, 254nm, or 220nm wavelength.

Electron-Beam Lithography/Microscopy Systems

Raith50 SEM & Ebeam
  • Raith50 SEM & Ebeam
    • Electron-beam lithography system (and SEM) for high-resolution (70nm) lithography and imaging characterization.

 

Capabilities & Equipment


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